Aluminum nitride (AlN) crystallizes in wurtzite structure (P63mc) with the lattice parameters of a=0.311 nm and c=0.498nm. AlN is a very promising material for application not only to surface acoustic wave (SAW) devices and optoelectronic devices for very short wavelength regions but also substrate materials. In the course of research on metal-organic vapor phase epitaxy (MOVPE) of AlN, it was found that the crystallinity of AlN depends upon the annealing temperature of sapphire substrate. In this work, detail characterization was conducted to clarify the origin of its annealing temperature dependence.
Prior to the deposition of AlN, a sapphire (0001) substrate (0.2 degree off toward m-direction) was annealed at Tan=1150 - 1350oC for surface-cleaning. Thereafter, AlN was deposited by MOVPE first at 1200oC to be 100nm in thickness and then overgrown at 1500oC. Thin-foil samples were made with a focused ion beam (FIB) mill (Hitachi. FB-2000K), followed by finishing with an argon-ion mill. TEM observation was performed with a JEM-2000EX microscope (JEOL). SEM observation and EBSD analysis were also carried out (Zeiss, Ultra55) for the AlN specimens without any prior treatment such as coating or etching.
It was found from the X-ray rocking curve (XRC) measurement that the twisting of AlN along c-axis is around 3 degree for Tan > 1250oC, while very little twisting occurs for Tan < 1250oC. Fig. 1 shows the results of TEM observation for the AlN specimens of Tan=1350oC and 1225oC. One can see that in both specimens, threading dislocations (TDs) have been formed and run upward. The densities of dislocations with screw and edge components are roughly estimated to be approximately 109 cm-2 and 1010 cm-2, respectively. In the specimen of Tan=1350oC, TDs are straight in shape and form a columnar structure of AlN. Fig.2 shows SEM and EBSD results of the specimens. In the SE (out-lens) image of the specimen of Tan=1350oC shown in (a), one can see pits and steps. In the SE (In-lens) image (b), dark winding line-contrast is recognized. The locations of the line contrast coincide with those of steps in (a). The grain reference orientation deviation (GROD) map (the maximum deviation~3o) shown in (c) indicates clearly that the dark line contrast corresponds to the boundaries of twisting domains. For the specimen of Tan=1225oC, on the other hand, pits and step are seen in the SE-image (Out-lens) shown in (d), but dark line contrast is not recognized in (e), and the GROD map in (f) does not indicate the existence of twisting domains. These results suggest that low-angle grain boundaries can be observed in SE image (In lens). The origin of the contrast is not clarified.
This work was partly supported by FRGS/2/2013/SG06/UTM/01/2-18865 from MOHE, Malaysia.